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Clean Oven Product List and Ranking from 10 Manufacturers, Suppliers and Companies | IPROS GMS

Last Updated: Aggregation Period:Jul 08, 2026~Aug 04, 2026
This ranking is based on the number of page views on our site.

Clean Oven Manufacturer, Suppliers and Company Rankings

Last Updated: Aggregation Period:Jul 08, 2026~Aug 04, 2026
This ranking is based on the number of page views on our site.

  1. 島川製作所 Osaka//Industrial Machinery
  2. ジェイテクトサーモシステム Nara//Electronic Components and Semiconductors
  3. エスペック Osaka//Industrial Electrical Equipment
  4. 4 ICM Saitama//Industrial Machinery
  5. 5 株式会社ダン科学 入間営業所 Saitama//Industrial Machinery

Clean Oven Product ranking

Last Updated: Aggregation Period:Jul 08, 2026~Aug 04, 2026
This ranking is based on the number of page views on our site.

  1. 300mm wafer-compatible clean oven 'SO2-12-F' ジェイテクトサーモシステム
  2. Dry Nitrogen N2 Clean Oven (Low Oxygen Specification) 島川製作所
  3. High-performance clean oven "PVHC" エスペック
  4. Drying Clean Oven Maximum 250°C Cleanliness Class 100 島川製作所
  5. 4 Clean Oven ICM

Clean Oven Product List

1~15 item / All 15 items

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Vacuum clean oven

Ideal for the sintering of electronic components. A groundbreaking heating device that ensures chemical resistance and uniform heat distribution.

Despite being in a vacuum, it can be heated uniformly.

  • Hydraulic Equipment
  • Electric furnace
  • Clean Oven

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High-performance clean oven "PVHC"

Clean heat treatment with cleanliness class 5! You can choose from suitable equipment types according to your intended use.

The "PVHC" is a high-performance oven that maintains high cleanliness even during temperature rises and falls. It is effective for thermal processing of samples requiring Class 5 clean air conditions, as well as for drying parts and equipment, and can be selected from suitable models according to the intended use. With a space-saving vertical slim design, instrumentation using large, highly visible LEDs, and operation keys with Japanese display, usability has been further enhanced. 【Features】 ■ Clean thermal processing with cleanliness class 5 ■ Contamination-free airtight structure ■ Achieves high-precision non-oxidizing atmosphere thermal processing ■ Fully automated operation possible throughout the entire thermal processing process ■ Maintains high cleanliness during temperature rises and falls *For more details, please refer to the PDF materials or feel free to contact us.

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  • Heating device
  • Clean Oven

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Low Oxygen Clean Oven for Semiconductor Packaging 'SCO Series'

Maintain a stable oxygen concentration at a few ppm level throughout the processes of temperature rise, stabilization, and decline!

We would like to introduce our low-oxygen clean oven for semiconductor packaging, the "SCO Series." By placing the cooling water flow path outside the chamber, we have adopted a unique structure that does not retain water inside the chamber. This ensures extremely high safety while reducing installation space and system electrical capacity by 50% compared to conventional models (compared to our own devices). The SCO Series meets the industry's highest levels of temperature control, low oxygen concentration, and high cleanliness required in various thermal processing steps of advanced packaging manufacturing processes. 【Features】 ■ Compatible with large panels of 515×510mm ■ High-precision thermal processing up to 500℃ ■ Achieves low oxygen concentration control below 10ppm ■ Maintains cleanliness class 4 stably ■ Compatible with automatic doors and GEM communication *For more details, please download the PDF or feel free to contact us.

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  • Heat Treatment Drying Equipment
  • Clean Oven

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300mm wafer-compatible clean oven 'SO2-12-F'

Clean oven for semiconductor manufacturing compatible with 300mm (12-inch) wafers.

The "SO2-12-F" is a clean oven for semiconductor manufacturing that incorporates the technology of the best-selling sheet-type clean oven used in FPD manufacturing equipment. It supports 300mm (12-inch) FOUP and can operate fully automatically. It can process up to 50 wafers per chamber and can be expanded to two chambers. It achieves high throughput and short cycle times with low-temperature processes such as polyimide curing. 【Features】 ■ Fully automatic clean oven compatible with FOUP ■ Up to 50 wafers per chamber ■ One robot can handle two chambers ■ Operates with 2 FOUPs per chamber ■ High-efficiency wafer transport with a dual-plate transport robot *For more details, please refer to the PDF document or feel free to contact us.

  • Heating device
  • Clean Oven

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Drying Clean Oven Maximum 250°C Cleanliness Class 100

Semiconductors, liquid crystals, electronic components, precision instruments, etc., are ideal for drying in a dust-free environment.

Using a heat-resistant HEPA filter, it maintains an internal cleanliness class of 100 at a maximum temperature of 250°C. The use of an inverter and internal slitters has equalized the air velocity distribution, achieving high-precision temperature distribution.

  • Drying Equipment
  • Heating device
  • Industrial Furnace
  • Clean Oven

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Dry Nitrogen N2 Clean Oven (Low Oxygen Specification)

Achieving both cleanliness and an N2 atmosphere. Comprehensive safety measures, including low oxygen sensors, are in place.

It is optimal for processes that require low oxygen during heat treatment even in clean ovens. By linking the oxygen concentration meter (PPM・%) with the programmed temperature controller, it is possible to set the heating and cooling programs while detecting the oxygen concentration. Options include atmosphere oxygen concentration detection alarms, door locks, and high-temperature specifications of 250°C, among others.

  • Heating device
  • Electric furnace
  • Other heaters
  • Clean Oven

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Clean Oven "CMO Type"

Clean oven using HEPA filter

Our company offers the clean oven "CMO type," which has improved temperature distribution both during no-load and load conditions, thanks to our unique horizontal circulation method. We also provide J-type ovens with a class around 1000 that use a quasi-HEPA filter. Custom models can be made to reach a maximum temperature of 350℃. Additionally, the floor load-bearing processing is easy. Please feel free to contact us if you have any requests. 【Specifications (excerpt)】 ■ Temperature range: Room temperature +20℃ to 200℃ / Room temperature +20℃ to 300℃ ■ Control method: P.I.D pulse-type non-contact control ■ Interior material: SPC baked paint ■ Safety devices: Digital over-temperature preventer, motor thermal protector, control circuit protector, leakage breaker, etc. *For more details, please download the PDF or contact us.

  • Heating device
  • Clean Oven

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Clean Oven "AHO-530"

Ideal for the sterile drying of medical devices and equipment! Achieves high cleanliness and temperature control.

We would like to introduce our clean oven, the "AHO-530." Equipped with a programmable temperature controller that enables step operation. There is also space at the bottom for storing equipment. Please feel free to contact us when you need assistance. 【Features】 ■ Maintenance with filter fixation using a snap lock ■ Equipped with a programmable temperature controller that enables step operation ■ Maximum of 16 patterns and 16 steps for setting time and temperature ■ Space available at the bottom for storing equipment *For more details, please refer to the PDF document or feel free to contact us.

  • Other clean room equipment and facilities
  • Other safety and hygiene products
  • Drying Equipment
  • Clean Oven

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Special Drying Device: Clean Oven

This is equipment suitable for use in clean rooms.

The HEPA filter allows for compatibility up to Class 1000. Precision machine parts and other items are heated and dried in a clean atmosphere.

  • Drying Equipment
  • Electric furnace
  • Clean Oven

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Low Oxygen Clean Oven for Substrates and Panels 'PVHC-31S'

A new model that meets the thermal processing needs of the expanding advanced semiconductor packaging field!

The "PVHC-31S" is a heat treatment solution designed to accommodate large workpieces and more precise heat treatment environments. Its unique structure, which places the cooling water flow path outside the furnace, eliminates dust sources within the furnace and ensures high temperature distribution performance through an efficient cooling mechanism and a simple air conditioning structure. Rapid cooling while maintaining a low-oxygen atmosphere contributes to quality assurance and reduced process time. 【Features】 ■ Supports heat treatment of large panel-shaped workpieces in the 600×600mm class ■ Achieves both low-oxygen atmosphere and high cleanliness, providing a stable process environment ■ Realizes safe and clean cooling capabilities by placing the water cooler outside the furnace ■ Compatible with automatic transport, process data management, and centralized equipment management ■ Allows for system configurations tailored to applications, including automatic doors and various interfaces and upper-level communication specifications *For more details, please download the PDF or feel free to contact us.

  • Heat Treatment Drying Equipment
  • Clean Oven

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Clean Oven

Supports a maximum operating temperature of 280°C! Oven with an internal cleanliness class of 100.

The "Clean Oven" is an oven that supports a maximum operating temperature of 280°C and has an internal cleanliness class of 100. We offer two types: the "Box-Type Clean Oven," which achieves high-precision temperature distribution, and the "Single-Layer Multi-Stage Clean Oven," which can also accommodate IR furnaces. This product is ideal for drying, firing, and curing processes involving LCDs (liquid crystal displays) and array color filters. 【Features】 ■ Supports a maximum operating temperature of 280°C ■ Internal cleanliness class of 100 ■ Excellent humidity distribution ■ Capable of supporting multiple ovens using robots For more details, please refer to the catalog or feel free to contact us.

  • Heating device
  • Clean Oven

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Clean Oven "DCH Series"

For constant temperature drying and testing in a dust-free environment! Space-saving, large capacity, high-precision clean oven.

The "DCH Series" is a clean oven that can be widely used for constant temperature drying and heat treatment up to 300°C. It employs a horizontal laminar flow circulation system and a highly reliable heat-resistant HEPA filter to achieve a clean environment with high precision temperature distribution. With a capacity of 360L to 600L, it can handle many samples while effectively utilizing the installation area due to its sturdy structure. 【Features】 ■ Cleanliness class 100 ■ Maximum temperature 300°C ■ Space-saving and large capacity ■ Compliant with GMP specifications ■ Indicates when to replace the air filter *For more details, please refer to the PDF document or feel free to contact us.

  • Drying Equipment
  • Clean Oven

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Automated transport cassette clean oven

Introducing the automatic cassette clean oven with a conveyor that can process one set at a time!

We would like to introduce our "Automated Transport Cassette Clean Oven." It is designed to handle a set of 6 cassettes, each containing 25 pieces of 8" wafers, using one clean oven along with loaders and unloaders equipped with transport robots. It is capable of processing one set at a time. The transport method can be either automatic or manual, and the maximum temperature inside the clean oven is 140°C. The external dimensions are 2590 (W) × 1400 (D) × 2400 (H). 【Main Specifications】 ■ Processed Wafers: 8” quartz wafers in cassettes × 6 ■ Transport Method: Automatic / Manual ■ Clean Oven Internal Temperature: MAX 140°C ■ Clean Oven Cleanliness: Class 10 at 0.3μm RT ■ External Dimensions: 2590 (W) × 1400 (D) × 2400 (H) *For more details, please refer to the PDF document or feel free to contact us.

  • Other conveying machines
  • Clean Oven

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